In this paper, we developed full-color nano-pixels with a nanoscale resolution based on plasmonic nano-slits. For this purpose, we combine electron beam lithography and dry etching nanotechnologies to nanofabricate plasmonic nano-slits behaving as polarization-dependent nano-pixels. Arrays of this nano-pixels with different lengths and periods are used for generation of different colors and consequently storing information. In addition, finite-difference time domain method is used to investigate the selection rule and the electric field distributions in these plasmonic nano-slits and compared them with the experimental results. It is revealed that the electric field distribution is perpendicular to the polarization of the excitation white light and the concentration is on the sharp edges close to the center of the nano-slits on the top and the bottom sides. These plasmonic surfaces are promising for anti-counterfeiting applications due to their nanoscale details, lack of the public access to the fabrication equipment and fabrication expertise. Therefore, these plasmonic surfaces have a great potential to be used for development of the next generation of credit cards, security labels and bank notes.